MOCVD (Metal Organic Chemical Vapor Deposition) is a technique for growing thin films of compound semiconductors with precision at the atomic level. Also known as "MOVPE/OMVPE (Metal-Organic Vapor Phase Epitaxy)", it is essentially the same technology as MOCVD and is a widely used method for crystal growth of compound semiconductors. The difference lies in the "way of calling" and "emphasis". Nippon Sanso has a wide lineup from R&D purpose to mass production use. In addition to MOCVD, we also handle equipment using HVPE technology. "HVPE" (Hydride Vapor Phase Epitaxy) is a type of vapor phase deposition method used for the crystal growth of compound semiconductors, especially for thick film growth and substrate fabrication of gallium nitride (GaN) and gallium oxide (Ga₂O₃).
It is used in the manufacturing technology of a wide range of applications such as LEDs, laser diodes, solar cells, power semiconductors, and optical communication devices. By using organometalls as raw materials, these devices can be fabricated as compound semiconductors, and they are used for performance and new functions that were not possible with conventional materials.
It is possible to grow typical compound semiconductor materials such as GaN (gallium nitride), GaAs (gallium arsenide), and InP (indium phosphorus). In addition to these, Nippon Sanso has also developed a device capable of growing Ga₂O₃ (gallium oxide), a next-generation material, and is compatible with a wide variety of compound semiconductors.
MOCVD is characterized by excellent mass production and high uniformity and repeatability. MBE has strengths in atomic layer control for research applications.
It consists of a reaction chamber (reactor), a gas supply system, an exhaust system, a control system, a wafer transport system, and a cleaning system. *The composition varies depending on the model.
Bulk gas supply equipment, cylinder cabinets, gas purifiers, exhaust gas abatement equipment, etc. are essential.
Handling toxic gases (AsH₃, PH₃, SiH4, etc.) and high-temperature environments requires gas management, exhaust treatment, and explosion-proof design.
Whether it's a vertical reactor (for GaAs/InP) or a horizontal reactor (for GaN systems), the design varies depending on the material. Nippon Sanso has developed horizontal reactor type which is classic. It is able to tunable and precise control for very uniform and high quality layer.
From 2" to 8", it can be used for a wide range of applications, from R&D to mass production. Please refer to the following for the lineup (*product page link)
Detailed calculations are required, including initial investment costs, utilities such as gas, raw materials, and electricity, as well as maintenance costs. It also varies greatly depending on the instrument model. For details, please contact us.
We are a long-established company that started the MOCVD equipment business in 1983, which was the first in the world. From the beginning of development, we have followed the horizontal flow and have key technologies such as three-layer flow technology, high-temperature technology, conveying technology, face-up/face-down, and ex-situ cleaning to meet the deposition requirements of low particle requirements and customer needs. For details on the key technologies of our equipment, please refer to the following (*link to the feature page)
If the equipment fails, an alarm will be displayed. Follow the alarm display to visually check the situation around the device to determine the cause. The same applies to stopping work due to interlock. If the device stops, it is considered to be stopped due to interlock. The cause of the operation can be checked and the equipment can be restored according to the interlock manual. For other problems, it may be necessary to repair or replace parts by a technician, so please contact us or contact the person in charge.
In this case, it could be disconnected or broken Heater element by end of life. Visually inspect the reactor to check the condition of the elements. Elements can be replaced according to the instruction manual. Nippon Sanso MOCVD design is user like, so the customer can access the heater unit area and can be exchange by themselves according to replacement procedure.